Fabrication of the X-Ray Mask using the Silicon Dry Etching
The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the X-ray mask was fabricated with UV lithography...
Main Authors: | Hiroshi TSUJII, Kazuma SHIMADA, Makoto TANAKA, Wataru YASHIRO, Daiji NODA, Tadashi HATTORI |
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Format: | Article |
Language: | English |
Published: |
The Japan Society of Mechanical Engineers
2008-04-01
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Series: | Journal of Advanced Mechanical Design, Systems, and Manufacturing |
Subjects: | |
Online Access: | https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_246/_pdf/-char/en |
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