The Inverse Optimization of Lithographic Source and Mask via GA-APSO Hybrid Algorithm
Source mask optimization (SMO) is an effective method for improving the image quality of high-node lithography. Reasonable algorithm optimization is the critical issue in SMO. A GA-APSO hybrid algorithm, combining genetic algorithm (GA) and adaptive particle swarm optimization (APSO), was proposed t...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-06-01
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| Series: | Photonics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2304-6732/10/6/638 |