Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells

Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se<sub>2</sub> (CIGS) solar cells. Before the deposition of TiN thin film on CIGS solar cells, a saturated growth rate of 0.67 Å/cycle was confir...

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Bibliographic Details
Main Authors: Hyun-Jae Woo, Woo-Jae Lee, Eun-Kyong Koh, Seung Il Jang, Shinho Kim, Hyoungseok Moon, Se-Hun Kwon
Format: Article
Language:English
Published: MDPI AG 2021-02-01
Series:Nanomaterials
Subjects:
CIGS solar cells
plasma-enhanced atomic layer deposition
TiN
Se diffusion barrier
Online Access:https://www.mdpi.com/2079-4991/11/2/370

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https://www.mdpi.com/2079-4991/11/2/370

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