Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Abstract As the crucial dimension (CD) of logic circuits continues to shrink, the photoresist metrics, including resolution, line edge roughness, and sensitivity, are faced with significant challenges. Photoresists are indispensable in the integrated circuit manufacturing industry, and specifically...

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Bibliographic Details
Main Authors: Jiaxing Gao, Siliang Zhang, Xuewen Cui, Xue Cong, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Guoqiang Yang
Format: Article
Language:English
Published: Wiley-VCH 2023-07-01
Series:Advanced Materials Interfaces
Subjects:
electron beam lithography
molecular glass negative photoresists
photoacid generators
photodegradable nucleophiles
Online Access:https://doi.org/10.1002/admi.202300194

Internet

https://doi.org/10.1002/admi.202300194

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