Fabrication of Low Loss Lithium Niobate Rib Waveguides Through Photoresist Reflow
We present lithography and argon plasma etching of lithium niobate on insulator (LNOI) rib waveguides using reflowed photoresist etch masks and 405 nm photolithography. Melting the photoresist at temperatures greatly exceeding its glass transition temperature while minimizing feature distortion thro...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2022-01-01
|
| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9950703/ |