Large-area patterning of sub-100 nm epitaxial L10 FePt dots array via nanoimprint lithography
Bit-patterned media, a promising candidate for next generation high density magnetic recording, requires sub-100 nm dots array on a wafer scale, a high degree of patterning control of the size distribution, and a material with high perpendicular anisotropy. In this work, large area (0.75 cm × 0.75 c...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2015-08-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4929578 |