Vacuum Leak Detection Method Using Index Regression and Correction for Semiconductor Equipment in a Vacuum Chamber
In semiconductor manufacturing, fault detection is an important method for monitoring equipment condition and examining the potential causes of a fault. Vacuum leakage is considered one of the major faults that can occur in semiconductor processing. An unnecessary O<sub>2</sub> and N<...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-12-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/11/24/11762 |