A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition
A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silica powder is used, as a first step to ultimately co...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-11-01
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| Series: | Chemical Engineering Journal Advances |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666821123001114 |
| _version_ | 1797388707267870720 |
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| author | Sana Aslam Abderrahime Sekkat Hugues Vergnes Jérôme Esvan Alessandro Pugliara Diane Samélor Nicolas Eshraghi Constantin Vahlas Jérémie Auvergniot Brigitte Caussat |
| author_facet | Sana Aslam Abderrahime Sekkat Hugues Vergnes Jérôme Esvan Alessandro Pugliara Diane Samélor Nicolas Eshraghi Constantin Vahlas Jérémie Auvergniot Brigitte Caussat |
| author_sort | Sana Aslam |
| collection | DOAJ |
| description | A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silica powder is used, as a first step to ultimately coat cohesive oxygen sensitive powders. The FBCVD process has been studied under mild temperature conditions (400–500 °C), without any containing oxygen co-reactant. The influence of the deposition parameters (temperature, total flow rate, precursor inlet molar fraction) on the process behavior (ATI vaporization rate, fluidized bed thermal profile, deposition yield) and on the coating characteristics (composition, thickness, morphology) is analysed in details. Results show that for all conditions tested, the fluidization is maintained and the bed remains almost isothermal all along the deposition experiments, allowing for a uniform coating of the whole particles of the bed. Continuous and conformal nanometric films are obtained, mainly formed of non-carbon contaminated alumina, containing however a small amount of hydroxyl bonds that could be due to air contamination. The proof of concept of using FBCVD from ATI to produce nanometric stoichiometric alumina coatings on powders is then demonstrated, opening the way for new applications. |
| first_indexed | 2024-03-08T22:44:42Z |
| format | Article |
| id | doaj.art-d3ef304a933d4afe99ef04215af5e83d |
| institution | Directory Open Access Journal |
| issn | 2666-8211 |
| language | English |
| last_indexed | 2024-03-08T22:44:42Z |
| publishDate | 2023-11-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Chemical Engineering Journal Advances |
| spelling | doaj.art-d3ef304a933d4afe99ef04215af5e83d2023-12-17T06:42:17ZengElsevierChemical Engineering Journal Advances2666-82112023-11-0116100554A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor depositionSana Aslam0Abderrahime Sekkat1Hugues Vergnes2Jérôme Esvan3Alessandro Pugliara4Diane Samélor5Nicolas Eshraghi6Constantin Vahlas7Jérémie Auvergniot8Brigitte Caussat9Laboratoire de Génie Chimique (LGC), Université de Toulouse CNRS, Toulouse, France; Centre Interuniversitaire de Recherche et d'Ingénierie des Matériaux (CIRIMAT), Université de Toulouse CNRS, Toulouse, FranceLaboratoire de Génie Chimique (LGC), Université de Toulouse CNRS, Toulouse, FranceLaboratoire de Génie Chimique (LGC), Université de Toulouse CNRS, Toulouse, FranceCentre Interuniversitaire de Recherche et d'Ingénierie des Matériaux (CIRIMAT), Université de Toulouse CNRS, Toulouse, FranceCentre de MicroCaractérisation Raimond Castaing, Université Toulouse III Paul Sabatier, Toulouse INP, INSA Toulouse, CNRS Université de Toulouse, FranceCentre Interuniversitaire de Recherche et d'Ingénierie des Matériaux (CIRIMAT), Université de Toulouse CNRS, Toulouse, FranceCorporate R&D-Umicore Belgium, Olen, BelgiumCentre Interuniversitaire de Recherche et d'Ingénierie des Matériaux (CIRIMAT), Université de Toulouse CNRS, Toulouse, FranceCorporate R&D-Umicore Belgium, Olen, BelgiumLaboratoire de Génie Chimique (LGC), Université de Toulouse CNRS, Toulouse, France; Corresponding author.A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silica powder is used, as a first step to ultimately coat cohesive oxygen sensitive powders. The FBCVD process has been studied under mild temperature conditions (400–500 °C), without any containing oxygen co-reactant. The influence of the deposition parameters (temperature, total flow rate, precursor inlet molar fraction) on the process behavior (ATI vaporization rate, fluidized bed thermal profile, deposition yield) and on the coating characteristics (composition, thickness, morphology) is analysed in details. Results show that for all conditions tested, the fluidization is maintained and the bed remains almost isothermal all along the deposition experiments, allowing for a uniform coating of the whole particles of the bed. Continuous and conformal nanometric films are obtained, mainly formed of non-carbon contaminated alumina, containing however a small amount of hydroxyl bonds that could be due to air contamination. The proof of concept of using FBCVD from ATI to produce nanometric stoichiometric alumina coatings on powders is then demonstrated, opening the way for new applications.http://www.sciencedirect.com/science/article/pii/S2666821123001114Chemical vapor depositionFluidized bedAlumina thin filmsSilica powderNanometric layers |
| spellingShingle | Sana Aslam Abderrahime Sekkat Hugues Vergnes Jérôme Esvan Alessandro Pugliara Diane Samélor Nicolas Eshraghi Constantin Vahlas Jérémie Auvergniot Brigitte Caussat A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition Chemical Engineering Journal Advances Chemical vapor deposition Fluidized bed Alumina thin films Silica powder Nanometric layers |
| title | A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| title_full | A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| title_fullStr | A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| title_full_unstemmed | A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| title_short | A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| title_sort | new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition |
| topic | Chemical vapor deposition Fluidized bed Alumina thin films Silica powder Nanometric layers |
| url | http://www.sciencedirect.com/science/article/pii/S2666821123001114 |
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