A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition

A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition

A new route to deposit alumina nanometric thin films on powders from the single source Aluminum Tri-Isopropoxide (ATI) precursor is developed using the Fluidized Bed Chemical Vapor Deposition (FBCVD) process. For this study, an easy-to-fluidize silica powder is used, as a first step to ultimately co...

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Bibliographic Details
Main Authors:	Sana Aslam, Abderrahime Sekkat, Hugues Vergnes, Jérôme Esvan, Alessandro Pugliara, Diane Samélor, Nicolas Eshraghi, Constantin Vahlas, Jérémie Auvergniot, Brigitte Caussat
Format:	Article
Language:	English
Published:	Elsevier 2023-11-01
Series:	Chemical Engineering Journal Advances
Subjects:	Chemical vapor deposition Fluidized bed Alumina thin films Silica powder Nanometric layers
Online Access:	http://www.sciencedirect.com/science/article/pii/S2666821123001114

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