Low‐Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors

Low‐Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors

Herein, the synthesis of vanadium sulfide (VxSy) by atomic layer deposition (ALD) based on the use of tetrakis(dimethylamino) vanadium (IV) and hydrogen sulfide is presented for the first time. The (ultra)thin films VxSy are synthesized in a wide range of temperatures (100–225 °C) and extensively ch...

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Bibliographic Details
Main Authors: Raul Zazpe, Marcela Sepúlveda, Jhonatan Rodriguez‐Pereira, Ludek Hromadko, Jan Michalicka, Eva Kolíbalová, Michal Kurka, Sitaramanjaneya M. Thalluri, Hanna Sopha, Jan M. Macak
Format: Article
Language:English
Published: Wiley-VCH 2024-04-01
Series:Small Structures
Subjects:
(ultra)thin films
atomic layer deposition
nanotubular structures
supercapacitors
vanadium sulfide
Online Access:https://doi.org/10.1002/sstr.202300512

Internet

https://doi.org/10.1002/sstr.202300512

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