Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching

Fabrication of SiNx Thin Film of Micro Dielectric Barrier Discharge Reactor for Maskless Nanoscale Etching

The prevention of glow-to-arc transition exhibited by micro dielectric barrier discharge (MDBD), as well as its long lifetime, has generated much excitement across a variety of applications. Silicon nitride (SiNx) is often used as a dielectric barrier layer in DBD due to its excellent chemical inert...

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Bibliographic Details
Main Authors: Qiang Li, Jie Liu, Yichuan Dai, Wushu Xiang, Man Zhang, Hai Wang, Li Wen
Format: Article
Language:English
Published: MDPI AG 2016-12-01
Series:Micromachines
Subjects:
silicon nitride
plasma enhanced chemical vapor deposition (PECVD)
multilayer thin films
residual stress
micro dielectric barrier discharge
simulation
Online Access:http://www.mdpi.com/2072-666X/7/12/232

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http://www.mdpi.com/2072-666X/7/12/232

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