Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity
In this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 μ Ω.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS)...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2020-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ab6f33 |