Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity
In this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 μ Ω.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS)...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2020-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/ab6f33 |
| _version_ | 1827868975144370176 |
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| author | Filiz Keleş Yavuz Atasoy Ayşe Seyhan |
| author_facet | Filiz Keleş Yavuz Atasoy Ayşe Seyhan |
| author_sort | Filiz Keleş |
| collection | DOAJ |
| description | In this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 μ Ω.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS) respectively, demonstrates good adhesivity and crystalline properties, together with high reflectance. In order to obtain Mo-bilayer with these improved properties, we first determined the optimal growth temperature and pressure parameters by checking the structural and electrical properties respectively of Mo-single layers. As a result, we achieved a deposit of Mo-bilayer thin film that can be used as a good back contact layer in solar cell applications, both in terms of material cost saving and its superior properties, even at such low thickness. |
| first_indexed | 2024-03-12T15:39:38Z |
| format | Article |
| id | doaj.art-d599552f70a040ab9fc0292aed0f399c |
| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:39:38Z |
| publishDate | 2020-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-d599552f70a040ab9fc0292aed0f399c2023-08-09T16:04:57ZengIOP PublishingMaterials Research Express2053-15912020-01-0161212645510.1088/2053-1591/ab6f33Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivityFiliz Keleş0https://orcid.org/0000-0003-4548-489XYavuz Atasoy1Ayşe Seyhan2Department of Physics, Nigde Ömer Halisdemir University , Nigde, Turkey; Nanotechnology Application and Research Center, Nigde Ömer Halisdemir University , Nigde, TurkeyNanotechnology Application and Research Center, Nigde Ömer Halisdemir University , Nigde, Turkey; Department of Opticianry, Nigde Ömer Halisdemir University , Nigde, TurkeyDepartment of Physics, Nigde Ömer Halisdemir University , Nigde, Turkey; Nanotechnology Application and Research Center, Nigde Ömer Halisdemir University , Nigde, TurkeyIn this study, Mo-bilayer film, the thickness of which was reduced to approximately 270 nm with a very low resistivity of 14 μ Ω.cm, was successfully grown by DC magnetron sputter. The Mo-bilayer, whose bottom and top layers were obtained by high pressure sputter (HPS) and low pressure sputter (LPS) respectively, demonstrates good adhesivity and crystalline properties, together with high reflectance. In order to obtain Mo-bilayer with these improved properties, we first determined the optimal growth temperature and pressure parameters by checking the structural and electrical properties respectively of Mo-single layers. As a result, we achieved a deposit of Mo-bilayer thin film that can be used as a good back contact layer in solar cell applications, both in terms of material cost saving and its superior properties, even at such low thickness.https://doi.org/10.1088/2053-1591/ab6f33Mo-bilayerDC sputterresistivitygrowth temperatureHPSLPS |
| spellingShingle | Filiz Keleş Yavuz Atasoy Ayşe Seyhan Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity Materials Research Express Mo-bilayer DC sputter resistivity growth temperature HPS LPS |
| title | Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity |
| title_full | Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity |
| title_fullStr | Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity |
| title_full_unstemmed | Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity |
| title_short | Sputtered Mo-bilayer thin films with reduced thickness and improved electrical resistivity |
| title_sort | sputtered mo bilayer thin films with reduced thickness and improved electrical resistivity |
| topic | Mo-bilayer DC sputter resistivity growth temperature HPS LPS |
| url | https://doi.org/10.1088/2053-1591/ab6f33 |
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