Pelgrom-Based Predictive Model to Estimate Metal Grain Granularity and Line Edge Roughness in Advanced Multigate MOSFETs
The impact of different variability sources on the transistor performance increases as devices are scaled-down, being the metal grain granularity (MGG) and the line edge roughness (LER) some of the major contributors to this increase. Variability studies require the simulation of large samples of di...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2022-01-01
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| Series: | IEEE Journal of the Electron Devices Society |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/9920014/ |