Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare t...

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Bibliographic Details
Main Authors: Ragesh Kumar T P, Sangeetha Hari, Krishna K Damodaran, Oddur Ingólfsson, Cornelis W. Hagen
Format: Article
Language:English
Published: Beilstein-Institut 2017-11-01
Series:Beilstein Journal of Nanotechnology
Subjects:
dichlorosilacyclohexane
dissociative electron attachment
dissociative ionization
electron beam induced deposition
low-energy electrons
silacyclohexane
Online Access:https://doi.org/10.3762/bjnano.8.237

Internet

https://doi.org/10.3762/bjnano.8.237

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