General nature of the step-induced frustration at ferromagnetic/antiferromagnetic interfaces: topological origin and quantitative understanding

We present a study of the magnetic configuration due to step-induced magnetic frustration at ferromagnetic/antiferromagnetic (FM/AFM) interfaces. At a substrate monatomic step edge, a 180° domain wall emerges. A physically appealing form for the thickness dependence of the domain wall width is obtai...

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Bibliographic Details
Main Authors: X Chen, T Z Ji, L Sun, B F Miao, Y T Millev, H F Ding
Format: Article
Language:English
Published: IOP Publishing 2019-01-01
Series:New Journal of Physics
Subjects:
Online Access:https://doi.org/10.1088/1367-2630/ab5cbd