General nature of the step-induced frustration at ferromagnetic/antiferromagnetic interfaces: topological origin and quantitative understanding
We present a study of the magnetic configuration due to step-induced magnetic frustration at ferromagnetic/antiferromagnetic (FM/AFM) interfaces. At a substrate monatomic step edge, a 180° domain wall emerges. A physically appealing form for the thickness dependence of the domain wall width is obtai...
Main Authors: | X Chen, T Z Ji, L Sun, B F Miao, Y T Millev, H F Ding |
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Format: | Article |
Language: | English |
Published: |
IOP Publishing
2019-01-01
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Series: | New Journal of Physics |
Subjects: | |
Online Access: | https://doi.org/10.1088/1367-2630/ab5cbd |
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