Electrochemical corrosion study of helium ions implanted Zircaloy-4 in chloride media

In this work, an attempt is made to improve the electrochemical corrosion resistance of Zircaloy-4 by helium ions implantation. For this purpose, the Zircaloy-4 was implanted with 300 keV helium ions of fluences 1 × 1013, 1 × 1015, and 1 × 1016 ions-cm−2 by using Pelletron Accelerator. Electrochemic...

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Bibliographic Details
Main Authors: Mohsin Rafique, Atika Khan, Naveed Afzal, Ameeq Farooq, M. Imran
Format: Article
Language:English
Published: Elsevier 2021-03-01
Series:Nuclear Engineering and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S1738573320307993