Novel Stacked Passivation Structure for AlGaN/GaN HEMTs on Silicon With High Johnson’s Figures of Merit
We present a high-performance AlGaN/GaN high electron mobility transistors (HEMTs) on silicon substrate with novel stacked passivation layer (HfO2/SiO2). The stacked passivation structure can effectively modulate the electric field and reduce the electric field peak on the gate side, thus improving...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2023-01-01
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| Series: | IEEE Journal of the Electron Devices Society |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10034658/ |