Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography

Recent Advances in Metal-Oxide-Based Photoresists for EUV Lithography

Extreme ultraviolet lithography (EUVL) is a leading technology in semiconductor manufacturing, enabling the creation of high-resolution patterns essential for advanced microelectronics. This review highlights recent progress in inorganic metal-oxide-based photoresists, with a focus on their applicat...

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Bibliographic Details
Main Authors: Muhammad Waleed Hasan, Laura Deeb, Sergei Kumaniaev, Chenglu Wei, Kaiying Wang
Format: Article
Language:English
Published: MDPI AG 2024-08-01
Series:Micromachines
Subjects:
inorganic photoresist
Zr
Hf
Zn
tin (Sn) oxides
EUV lithography
Online Access:https://www.mdpi.com/2072-666X/15/9/1122

Internet

https://www.mdpi.com/2072-666X/15/9/1122

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