Recent Advances in Organic-inorganic Hybrid Photoresists

Recent Advances in Organic-inorganic Hybrid Photoresists

Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices. To date, most photoresists have been based on organic polymers, which have been dominating the semiconductor industries over the past few decades. It is obvious that extreme ultraviolet (EUV) lithography...

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Bibliographic Details
Main Authors: Zhihao Wang, Xindi Yao, Huiwen An, Yake Wang, Jinping Chen, Shuangqing Wang, Xudong Guo, Tianjun Yu, Yi Zeng, Guoqiang Yang, Yi Li
Format: Article
Language:English
Published: JommPublish 2021-03-01
Series:Journal of Microelectronic Manufacturing
Subjects:
organic-inorganic hybrid photoresist
euv lithography
nanocluster
nanoparticle
organometallic complex
Online Access:http://www.jommpublish.org/p/69/

Internet

http://www.jommpublish.org/p/69/

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