Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques. In the past few years, the development and recent advances in atomic layer deposition (ALD) processes boosted in...

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Bibliographic Details
Main Authors: William Chiappim, Benedito Botan Neto, Michaela Shiotani, Júlia Karnopp, Luan Gonçalves, João Pedro Chaves, Argemiro da Silva Sobrinho, Joaquim Pratas Leitão, Mariana Fraga, Rodrigo Pessoa
Format: Article
Language:English
Published: MDPI AG 2022-10-01
Series:Nanomaterials
Subjects:
plasma-enhanced atomic layer deposition
plasma-assisted atomic layer deposition
radical-enhanced atomic layer deposition
plasma-atomic layer etching
ALD
non-thermal plasma
Online Access:https://www.mdpi.com/2079-4991/12/19/3497

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https://www.mdpi.com/2079-4991/12/19/3497

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