Fabrication and Characterization of Capacitive RF MEMS Perforated Switch

Fabrication and Characterization of Capacitive RF MEMS Perforated Switch

In this paper, we have designed, simulated, fabricated, and characterized a clamped-clamped micro mechanical structure-based shunt capacitive RF MEMS switch. The clamped-clamped micromechanical structure is micromachined using a gold metal thickness of 500 nm. AlN is used as a dielectric material, a...

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Bibliographic Details
Main Authors: K. Srinivasa Rao, Lakshmi Narayana Thalluri, Koushik Guha, K. Girija Sravani
Format: Article
Language:English
Published: IEEE 2018-01-01
Series:IEEE Access
Subjects:
CPW transmission line
MEMS Technology
micromachining
metal and dielectric material deposition
MEMS structure release
dielectric charging
Online Access:https://ieeexplore.ieee.org/document/8573774/

Internet

https://ieeexplore.ieee.org/document/8573774/

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