Crystallinity-Controlled Atomic Layer Deposition of Ti-Doped ZrO2 Thin Films

Crystallinity-Controlled Atomic Layer Deposition of Ti-Doped ZrO2 Thin Films

We investigated Ti-doped ZrO _2 deposition using a cyclopentadienyl tris(dimethylamino) zirconium (CpZr(NMe _2 ) _3 ) precursor and a titanium tetraisopropoxide (TTIP) precursor using an O _3 thermal atomic layer deposition process. In addition, the effect of Ti doping concentration on the chemical...

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Bibliographic Details
Main Authors: Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Format: Article
Language:English
Published: IOP Publishing 2024-01-01
Series:ECS Advances
Subjects:
dielectrics - high-k
atomic layer deposition
X-ray diffraction
Online Access:https://doi.org/10.1149/2754-2734/ad1a75

Internet

https://doi.org/10.1149/2754-2734/ad1a75

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