Graphene/Ferroelectric (Ge-Doped HfO<sub>2</sub>) Adaptable Transistors Acting as Reconfigurable Logic Gates
We present an array of 225 field-effect transistors (FETs), where each of them has a graphene monolayer channel grown on a 3-layer deposited stack of 22 nm control HfO<sub>2</sub>/5 nm Ge-HfO<sub>2</sub> intermediate layer/8 nm tunnel HfO<sub>2</sub>/<i>p<...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-01-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/12/2/279 |