Diffraction-Based Overlay Metrology With Optical Convolution Layer

Overlay is a crucial indicator of manufacturing processing between layers. Currently, diffraction-based overlay (DBO) is widely adopted in overlay metrology. In response to existing challenges in DBO metrology, this study applied the concept of optical computing to establish a DBO metrology with an...

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Bibliographic Details
Main Authors: Jinyang Li, Hung-Fei Kuo
Format: Article
Language:English
Published: IEEE 2023-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/10323151/