Contact resistance optimization for development of thermoelectric modules based on bismuth telluride nanowires

Contact resistance optimization for development of thermoelectric modules based on bismuth telluride nanowires

This paper presents a study of the contact resistance between a metal M (M = Ni, Pt, and Au) and an array of n-type Bi2Te3−xSex thermoelectric nanowires deposited through the electrodeposition process in the alumina membrane. Contact resistances between different metals and thermoelectric nanowires...

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Bibliographic Details
Main Authors: Meriam Ben Khedim, Laurent Cagnon, Emmanuel André, Sébastien Pairis, Valerie Serradeil, Daniel Bourgault
Format: Article
Language:English
Published: AIP Publishing LLC 2021-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0043940

Internet

http://dx.doi.org/10.1063/5.0043940

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