Focused Ion Beam Milling of Single-Crystal Sapphire with A-, C-, and M-Orientations

Focused Ion Beam Milling of Single-Crystal Sapphire with A-, C-, and M-Orientations

Sapphire substrates with different crystal orientations are widely used in optoelectronic applications. In this work, focused ion beam (FIB) milling of single-crystal sapphire with A-, C-, and M-orientations was performed. The material removal rate (MRR) and surface roughness (Sa) of sapphire with t...

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Bibliographic Details
Main Authors: Qiuling Wen, Xinyu Wei, Feng Jiang, Jing Lu, Xipeng Xu
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Materials
Subjects:
sapphire
focused ion beam
crystal orientation
etching
material removal rate
surface roughness
Online Access:https://www.mdpi.com/1996-1944/13/12/2871

Internet

https://www.mdpi.com/1996-1944/13/12/2871

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