Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering

Background Pressure Induced Structural and Chemical Change in NiV/B4C Multilayers Prepared by Magnetron Sputtering

NiV/B4C multilayers with a small d-spacing are suitable for multilayer monochromator working at a photon energy region from 5 to 8 keV, or photon energy region from 10 to 100 keV. To investigate the influence of background pressure during fabrication, NiV/B4C multilayers with a d-spacing of 3.0 nm w...

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Bibliographic Details
Main Authors: Zhenbo Wei, Zhe Zhang, Li Jiang, Yang Yang, Chenyuan Chang, Yufei Feng, Runze Qi, Qiushi Huang, Wensheng Yan, Chun Xie, Zhanshan Wang
Format: Article
Language:English
Published: Frontiers Media S.A. 2022-03-01
Series:Frontiers in Physics
Subjects:
NiV/B4C
multilayer
magnetron sputtering
XANES
background pressure
Online Access:https://www.frontiersin.org/articles/10.3389/fphy.2022.837819/full

Internet

https://www.frontiersin.org/articles/10.3389/fphy.2022.837819/full

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