Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films
A single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10<sup>−3</sup> Ω·cm after UV-irradiation. The transmit...
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MDPI AG
2021-12-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/11/12/3404 |
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| author | Naoki Ogawa Hiroki Nagai Yukihiro Kudoh Takeyoshi Onuma Taichi Murayama Akinobu Nojima Mitsunobu Sato |
| author_facet | Naoki Ogawa Hiroki Nagai Yukihiro Kudoh Takeyoshi Onuma Taichi Murayama Akinobu Nojima Mitsunobu Sato |
| author_sort | Naoki Ogawa |
| collection | DOAJ |
| description | A single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10<sup>−3</sup> Ω·cm after UV-irradiation. The transmittance was >80% at 178–2600 nm, and 79%–73% at 220–352 nm. Heat treatment increased the transparency and pencil hardness, without affecting the low electrical resistivity. Raman spectroscopy and microscopic analyses revealed the excellent film morphology with good SWCNT dispersal. The low refractive index (1.49) and haze value (<1.5%) are invaluable for transparent windows for novel optoelectronic devices. |
| first_indexed | 2024-03-10T03:26:48Z |
| format | Article |
| id | doaj.art-dd7cd1269b024f939ac9919543c8dedb |
| institution | Directory Open Access Journal |
| issn | 2079-4991 |
| language | English |
| last_indexed | 2024-03-10T03:26:48Z |
| publishDate | 2021-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj.art-dd7cd1269b024f939ac9919543c8dedb2023-11-23T09:52:09ZengMDPI AGNanomaterials2079-49912021-12-011112340410.3390/nano11123404Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor FilmsNaoki Ogawa0Hiroki Nagai1Yukihiro Kudoh2Takeyoshi Onuma3Taichi Murayama4Akinobu Nojima5Mitsunobu Sato6Electrical Engineering and Electronics Program, Graduate School, Kogakuin University, Tokyo 192-0015, JapanDepartment of Applied Physics, School of Advanced Engineering, Kogakuin University, Tokyo 192-0015, JapanDepartment of Information and Communications Engineering, Faculty of Informatics, Kogakuin University, Tokyo 192-0015, JapanDepartment of Applied Physics, School of Advanced Engineering, Kogakuin University, Tokyo 192-0015, JapanElectrical Engineering and Electronics Program, Graduate School, Kogakuin University, Tokyo 192-0015, JapanAdvanced Products Development Center, Technology & Intellectual Property HQ, TDK Corporation, Nagano 385-8555, JapanDepartment of Applied Physics, School of Advanced Engineering, Kogakuin University, Tokyo 192-0015, JapanA single-walled carbon nanotube (SWCNT)-silica composite thin film on a quartz glass was formed by ultraviolet irradiation (20–40 °C) onto a spin-coated precursor film. With 7.4 mass% SWCNTs, the electrical resistivity reached 7.7 × 10<sup>−3</sup> Ω·cm after UV-irradiation. The transmittance was >80% at 178–2600 nm, and 79%–73% at 220–352 nm. Heat treatment increased the transparency and pencil hardness, without affecting the low electrical resistivity. Raman spectroscopy and microscopic analyses revealed the excellent film morphology with good SWCNT dispersal. The low refractive index (1.49) and haze value (<1.5%) are invaluable for transparent windows for novel optoelectronic devices.https://www.mdpi.com/2079-4991/11/12/3404deep ultravioletvacuum ultravioletnear infraredtransparentconductive thin filmSWCNT/SiO<sub>2</sub> |
| spellingShingle | Naoki Ogawa Hiroki Nagai Yukihiro Kudoh Takeyoshi Onuma Taichi Murayama Akinobu Nojima Mitsunobu Sato Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films Nanomaterials deep ultraviolet vacuum ultraviolet near infrared transparent conductive thin film SWCNT/SiO<sub>2</sub> |
| title | Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films |
| title_full | Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films |
| title_fullStr | Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films |
| title_full_unstemmed | Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films |
| title_short | Fabrication of Transparent and Conductive SWCNT/SiO<sub>2</sub> Composite Thin-Film by Photo-Irradiation of Molecular Precursor Films |
| title_sort | fabrication of transparent and conductive swcnt sio sub 2 sub composite thin film by photo irradiation of molecular precursor films |
| topic | deep ultraviolet vacuum ultraviolet near infrared transparent conductive thin film SWCNT/SiO<sub>2</sub> |
| url | https://www.mdpi.com/2079-4991/11/12/3404 |
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