Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films

Bibliographic Details
Main Authors:	Müllerová Jarmila, Fischer Marinus, Netrvalová Marie, Zeman Miro, Šutta Pavel
Format:	Article
Language:	English
Published:	De Gruyter 2011-10-01
Series:	Open Physics
Subjects:	amorphous silicon thin films structure temperature
Online Access:	https://doi.org/10.2478/s11534-011-0041-4

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