Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2011-10-01
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| Series: | Open Physics |
| Subjects: | |
| Online Access: | https://doi.org/10.2478/s11534-011-0041-4 |
| _version_ | 1818731761742381056 |
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| author | Müllerová Jarmila Fischer Marinus Netrvalová Marie Zeman Miro Šutta Pavel |
| author_facet | Müllerová Jarmila Fischer Marinus Netrvalová Marie Zeman Miro Šutta Pavel |
| author_sort | Müllerová Jarmila |
| collection | DOAJ |
| first_indexed | 2024-12-17T23:22:49Z |
| format | Article |
| id | doaj.art-dfe81bbac48a43899be01a1d36c7142b |
| institution | Directory Open Access Journal |
| issn | 2391-5471 |
| language | English |
| last_indexed | 2024-12-17T23:22:49Z |
| publishDate | 2011-10-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Open Physics |
| spelling | doaj.art-dfe81bbac48a43899be01a1d36c7142b2022-12-21T21:28:50ZengDe GruyterOpen Physics2391-54712011-10-01951301130810.2478/s11534-011-0041-4Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin filmsMüllerová Jarmila0Fischer Marinus1Netrvalová Marie2Zeman Miro3Šutta Pavel4Department of Engineering Fundamentals, Faculty of Electrical Engineering, University of Žilina, ul. kpt. J. Nálepku 1390, 031 01, Liptovský Mikuláš, SlovakiaDelft Institute of Microsystems and Nanoelectronics (DIMES), Delft University of Technology, 2628 CT, Delft, The NetherlandsNew Technologies — Research Center, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech RepublicDelft Institute of Microsystems and Nanoelectronics (DIMES), Delft University of Technology, 2628 CT, Delft, The NetherlandsNew Technologies — Research Center, University of West Bohemia, Univerzitní 8, 306 14, Plzeň, Czech Republichttps://doi.org/10.2478/s11534-011-0041-4amorphous siliconthin filmsstructuretemperature |
| spellingShingle | Müllerová Jarmila Fischer Marinus Netrvalová Marie Zeman Miro Šutta Pavel Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films Open Physics amorphous silicon thin films structure temperature |
| title | Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films |
| title_full | Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films |
| title_fullStr | Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films |
| title_full_unstemmed | Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films |
| title_short | Influence of deposition temperature on amorphous structure of PECVD deposited a-Si:H thin films |
| title_sort | influence of deposition temperature on amorphous structure of pecvd deposited a si h thin films |
| topic | amorphous silicon thin films structure temperature |
| url | https://doi.org/10.2478/s11534-011-0041-4 |
| work_keys_str_mv | AT mullerovajarmila influenceofdepositiontemperatureonamorphousstructureofpecvddepositedasihthinfilms AT fischermarinus influenceofdepositiontemperatureonamorphousstructureofpecvddepositedasihthinfilms AT netrvalovamarie influenceofdepositiontemperatureonamorphousstructureofpecvddepositedasihthinfilms AT zemanmiro influenceofdepositiontemperatureonamorphousstructureofpecvddepositedasihthinfilms AT suttapavel influenceofdepositiontemperatureonamorphousstructureofpecvddepositedasihthinfilms |