Surface Localization of Buried III–V Semiconductor Nanostructures

<p>Abstract</p> <p>In this work, we study the top surface localization of InAs quantum dots once capped by a GaAs layer grown by molecular beam epitaxy. At the used growth conditions, the underneath nanostructures are revealed at the top surface as mounding features that match thei...

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Main Authors: Alonso-Gonz&#225;lez P, Gonz&#225;lez L, Fuster D, Mart&#237;n-S&#225;nchez J, Gonz&#225;lez Yolanda
Format: Article
Language:English
Published: SpringerOpen 2009-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://dx.doi.org/10.1007/s11671-009-9329-3
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author Alonso-Gonz&#225;lez P
Gonz&#225;lez L
Fuster D
Mart&#237;n-S&#225;nchez J
Gonz&#225;lez Yolanda
author_facet Alonso-Gonz&#225;lez P
Gonz&#225;lez L
Fuster D
Mart&#237;n-S&#225;nchez J
Gonz&#225;lez Yolanda
author_sort Alonso-Gonz&#225;lez P
collection DOAJ
description <p>Abstract</p> <p>In this work, we study the top surface localization of InAs quantum dots once capped by a GaAs layer grown by molecular beam epitaxy. At the used growth conditions, the underneath nanostructures are revealed at the top surface as mounding features that match their density with independence of the cap layer thickness explored (from 25 to 100 nm). The correspondence between these mounds and the buried nanostructures is confirmed by posterior selective strain-driven formation of new nanostructures on top of them, when the distance between the buried and the superficial nanostructures is short enough (<it>d</it> = 25 nm).</p>
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spelling doaj.art-e103975da20549abb243fe069eb2b8812023-09-03T02:12:48ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2009-01-0148873877Surface Localization of Buried III&#8211;V Semiconductor NanostructuresAlonso-Gonz&#225;lez PGonz&#225;lez LFuster DMart&#237;n-S&#225;nchez JGonz&#225;lez Yolanda<p>Abstract</p> <p>In this work, we study the top surface localization of InAs quantum dots once capped by a GaAs layer grown by molecular beam epitaxy. At the used growth conditions, the underneath nanostructures are revealed at the top surface as mounding features that match their density with independence of the cap layer thickness explored (from 25 to 100 nm). The correspondence between these mounds and the buried nanostructures is confirmed by posterior selective strain-driven formation of new nanostructures on top of them, when the distance between the buried and the superficial nanostructures is short enough (<it>d</it> = 25 nm).</p>http://dx.doi.org/10.1007/s11671-009-9329-3Droplet epitaxyIII&#8211;V Semiconductor nanostructuresMBE
spellingShingle Alonso-Gonz&#225;lez P
Gonz&#225;lez L
Fuster D
Mart&#237;n-S&#225;nchez J
Gonz&#225;lez Yolanda
Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
Nanoscale Research Letters
Droplet epitaxy
III&#8211;V Semiconductor nanostructures
MBE
title Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
title_full Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
title_fullStr Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
title_full_unstemmed Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
title_short Surface Localization of Buried III&#8211;V Semiconductor Nanostructures
title_sort surface localization of buried iii 8211 v semiconductor nanostructures
topic Droplet epitaxy
III&#8211;V Semiconductor nanostructures
MBE
url http://dx.doi.org/10.1007/s11671-009-9329-3
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AT gonz225lezl surfacelocalizationofburiediii8211vsemiconductornanostructures
AT fusterd surfacelocalizationofburiediii8211vsemiconductornanostructures
AT mart237ns225nchezj surfacelocalizationofburiediii8211vsemiconductornanostructures
AT gonz225lezyolanda surfacelocalizationofburiediii8211vsemiconductornanostructures