Analysis of Thermal Stress in Vanadium Dioxide Thin Films by Finite Element Method
The buckling, de-lamination, and cracking of the thin film/substrate system caused by thermal stress is the main obstacle for functional failure. Moreover, the thermal stress of vanadium dioxide (VO<sub>2</sub>) thin film may be more complicated due to the stress re-distribution caused b...
Main Authors: | , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-11-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/12/23/4262 |