Investigation of Morphological, Optical, and Dielectric Properties of RF Sputtered WO<sub>x</sub> Thin Films for Optoelectronic Applications

Investigation of Morphological, Optical, and Dielectric Properties of RF Sputtered WO<sub>x</sub> Thin Films for Optoelectronic Applications

Tungsten oxide (WO<sub>x</sub>) thin films were synthesized through the RF magnetron sputtering method by varying the sputtering power from 30 W to 80 W. Different investigations have been conducted to evaluate the variation in different morphological, optical, and dielectric properties...

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Bibliographic Details
Main Authors: Samiya Mahjabin, Md. Mahfuzul Haque, K. Sobayel, Vidhya Selvanathan, M. S. Jamal, M. S. Bashar, Munira Sultana, Mohammad Ismail Hossain, Md. Shahiduzzaman, Merfat Algethami, Sami S. Alharthi, Nowshad Amin, Kamaruzzaman Sopian, Md. Akhtaruzzaman
Format: Article
Language:English
Published: MDPI AG 2022-10-01
Series:Nanomaterials
Subjects:
tungsten oxide
sputtering
RF magnetron sputtering
metal oxide
photovoltaic
optoelectronics
Online Access:https://www.mdpi.com/2079-4991/12/19/3467

Internet

https://www.mdpi.com/2079-4991/12/19/3467

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