Design parameters of a reluctance actuation system for stable operation conditions with applications of high‐precision motions in lithography machines
Abstract Recently, the reluctance actuator has attracted great attention to replace the Lorentz actuator in the next generation of wafer scanners in semi‐conductor lithography machines. The reluctance actuator has a non‐linear position‐force characteristic, which may cause high oscillations and unst...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2022-01-01
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| Series: | IET Electric Power Applications |
| Subjects: | |
| Online Access: | https://doi.org/10.1049/elp2.12135 |