Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys

Abstract The spin Hall effect enables fast and reliable writing operations for next‐generation spin‐orbit‐torque magnetoresistive random‐access memories (SOT‐MRAMs). To develop SOT‐MRAMs; however, the spin Hall material should have a sufficiently low writing energy and high annealing stability for t...

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Main Authors: Yuki Hibino, Tatsuya Yamamoto, Kay Yakushiji, Tomohiro Taniguchi, Hitoshi Kubota, Shinji Yuasa
Format: Article
Language:English
Published: Wiley-VCH 2024-03-01
Series:Advanced Electronic Materials
Subjects:
Online Access:https://doi.org/10.1002/aelm.202300581
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author Yuki Hibino
Tatsuya Yamamoto
Kay Yakushiji
Tomohiro Taniguchi
Hitoshi Kubota
Shinji Yuasa
author_facet Yuki Hibino
Tatsuya Yamamoto
Kay Yakushiji
Tomohiro Taniguchi
Hitoshi Kubota
Shinji Yuasa
author_sort Yuki Hibino
collection DOAJ
description Abstract The spin Hall effect enables fast and reliable writing operations for next‐generation spin‐orbit‐torque magnetoresistive random‐access memories (SOT‐MRAMs). To develop SOT‐MRAMs; however, the spin Hall material should have a sufficiently low writing energy and high annealing stability for the semiconductor integration process. Thus far, none of the crystalline‐based spin Hall materials are able to satisfy these requirements. Here, a promising solution for SOT‐MRAMs is provided using amorphous W─Ta─B alloys. Even without a long‐range crystal order, W─Ta─B alloys exhibit both large effective spin Hall angles up to 40% derived from a Ta substitutional doping and superior annealing stability (up to 400 °C) due to the addition of B, enabling them to satisfy both requirements. Nanoscale three‐terminal SOT‐MRAM cells are fabricated, and these are demonstrated to have high magnetoresistance ratios (up to 130%) and extremely low intrinsic switching current densities (down to 4 × 106 A cm−2). These results show that amorphous spin Hall materials can provide the key for realizing high‐performance SOT‐MRAMs.
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spelling doaj.art-e3ff599eefef479eba3e9534646e77a32024-03-07T15:46:04ZengWiley-VCHAdvanced Electronic Materials2199-160X2024-03-01103n/an/a10.1002/aelm.202300581Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B AlloysYuki Hibino0Tatsuya Yamamoto1Kay Yakushiji2Tomohiro Taniguchi3Hitoshi Kubota4Shinji Yuasa5National Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanNational Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanNational Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanNational Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanNational Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanNational Institute of Advanced Industrial Science and Technology (AIST) Research Center for Emerging Computing Technologies (RCECT) Tsukuba Ibaraki 305–8568 JapanAbstract The spin Hall effect enables fast and reliable writing operations for next‐generation spin‐orbit‐torque magnetoresistive random‐access memories (SOT‐MRAMs). To develop SOT‐MRAMs; however, the spin Hall material should have a sufficiently low writing energy and high annealing stability for the semiconductor integration process. Thus far, none of the crystalline‐based spin Hall materials are able to satisfy these requirements. Here, a promising solution for SOT‐MRAMs is provided using amorphous W─Ta─B alloys. Even without a long‐range crystal order, W─Ta─B alloys exhibit both large effective spin Hall angles up to 40% derived from a Ta substitutional doping and superior annealing stability (up to 400 °C) due to the addition of B, enabling them to satisfy both requirements. Nanoscale three‐terminal SOT‐MRAM cells are fabricated, and these are demonstrated to have high magnetoresistance ratios (up to 130%) and extremely low intrinsic switching current densities (down to 4 × 106 A cm−2). These results show that amorphous spin Hall materials can provide the key for realizing high‐performance SOT‐MRAMs.https://doi.org/10.1002/aelm.202300581amorphous materialsmagnetic random access memory (MRAM)magnetic tunnel junctionspin hall effectspin‐orbit torque
spellingShingle Yuki Hibino
Tatsuya Yamamoto
Kay Yakushiji
Tomohiro Taniguchi
Hitoshi Kubota
Shinji Yuasa
Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
Advanced Electronic Materials
amorphous materials
magnetic random access memory (MRAM)
magnetic tunnel junction
spin hall effect
spin‐orbit torque
title Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
title_full Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
title_fullStr Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
title_full_unstemmed Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
title_short Highly Energy‐Efficient Spin‐Orbit‐Torque Magnetoresistive Memory with Amorphous W─Ta─B Alloys
title_sort highly energy efficient spin orbit torque magnetoresistive memory with amorphous w─ta─b alloys
topic amorphous materials
magnetic random access memory (MRAM)
magnetic tunnel junction
spin hall effect
spin‐orbit torque
url https://doi.org/10.1002/aelm.202300581
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