Performance Evaluation of CNN-Based End-Point Detection Using In-Situ Plasma Etching Data
As the technology node shrinks and shifts towards complex architectures, accurate control of automated semiconductor manufacturing processes, particularly plasma etching, is crucial in yield, cost, and semiconductor performance. However, current endpoint detection (EPD) methods relying on the experi...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-12-01
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Series: | Electronics |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-9292/10/1/49 |