Extensive Analysis on the Effects of Post-Deposition Annealing for ALD-Deposited Al<sub>2</sub>O<sub>3</sub> on an n-Type Silicon Substrate
In this study, an investigation was performed on the properties of atomic-layer-deposited aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) on an n-type silicon (n-Si) substrate based on the effect of post-deposition heat treatment, which was speckled according to ambient temperat...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-06-01
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| Series: | Materials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/1996-1944/14/12/3328 |