A review of the mechanism and optimization of metal-assisted chemical etching and applications in semiconductors
Abstract Metal-Assisted Chemical Etching (MACE) is a technique for precisely forming nanostructures on semiconductor substrates, and it is actively researched in various fields such as electronic devices, optoelectronic devices, energy storage, and conversion systems. This process offers economic ef...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2024-12-01
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| Series: | Micro and Nano Systems Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s40486-024-00217-x |