Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance

Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance

High-entropy ceramics exhibit novel intrinsic properties. Hence, they have been explored for a wide range of applications ranging from thermal insulation and energy storage to advanced optical components. Recently, the semiconductor industry has faced a demand for higher-performance chips, necessita...

Deskribapen osoa

Xehetasun bibliografikoak
Egile Nagusiak: Yu-Bin Shin, Su Been Ham, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Young-Jo Park, Jung-Hyung Kim, Hyo-Chang Lee, Young Hwa Jung, Jung Woo Lee, Ho Jin Ma
Formatua: Artikulua
Hizkuntza:English
Argitaratua: Tsinghua University Press 2025-01-01
Saila:Journal of Advanced Ceramics
Gaiak:
high-entropy ceramics
plasma etching resistance
transparent ceramics
sintering
semiconductor manufacturing
Sarrera elektronikoa:https://www.sciopen.com/article/10.26599/JAC.2024.9221013

Internet

https://www.sciopen.com/article/10.26599/JAC.2024.9221013

Antzeko izenburuak