Extreme Ultraviolet Radiation Sources from Dense Plasmas
The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range. Such sources are used for nanoscale imaging and structuring applications, such as EUV lithography in the semiconductor industry. An understa...
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-08-01
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| Series: | Atoms |
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| Online Access: | https://www.mdpi.com/2218-2004/11/9/118 |