Extreme Ultraviolet Radiation Sources from Dense Plasmas
The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range. Such sources are used for nanoscale imaging and structuring applications, such as EUV lithography in the semiconductor industry. An understa...
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-08-01
|
| Series: | Atoms |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2218-2004/11/9/118 |
| _version_ | 1827727259249672192 |
|---|---|
| author | Klaus Bergmann |
| author_facet | Klaus Bergmann |
| author_sort | Klaus Bergmann |
| collection | DOAJ |
| description | The concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range. Such sources are used for nanoscale imaging and structuring applications, such as EUV lithography in the semiconductor industry. An understanding of light-generating atomic processes and radiation transport within the plasma is mandatory for optimization. The basic principles and technical concepts using either a pulsed laser or a gas discharge for plasma generation are presented, and critical aspects in the ionization dynamics are outlined within the framework of a simplified atomic physics model. |
| first_indexed | 2024-03-10T23:04:01Z |
| format | Article |
| id | doaj.art-e6ae08f486854400b3c97981f8c84c31 |
| institution | Directory Open Access Journal |
| issn | 2218-2004 |
| language | English |
| last_indexed | 2024-03-10T23:04:01Z |
| publishDate | 2023-08-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Atoms |
| spelling | doaj.art-e6ae08f486854400b3c97981f8c84c312023-11-19T09:31:46ZengMDPI AGAtoms2218-20042023-08-0111911810.3390/atoms11090118Extreme Ultraviolet Radiation Sources from Dense PlasmasKlaus Bergmann0Fraunhofer Institute for Laser Technology ILT, Steinbachstr. 15, D-52074 Aachen, GermanyThe concept of dense and hot plasmas can be used to build up powerful and brilliant radiation sources in the soft X-ray and extreme ultraviolet spectral range. Such sources are used for nanoscale imaging and structuring applications, such as EUV lithography in the semiconductor industry. An understanding of light-generating atomic processes and radiation transport within the plasma is mandatory for optimization. The basic principles and technical concepts using either a pulsed laser or a gas discharge for plasma generation are presented, and critical aspects in the ionization dynamics are outlined within the framework of a simplified atomic physics model.https://www.mdpi.com/2218-2004/11/9/118XUV light sourceplasma radiation sourcelaser-produced plasmadischarge plasma |
| spellingShingle | Klaus Bergmann Extreme Ultraviolet Radiation Sources from Dense Plasmas Atoms XUV light source plasma radiation source laser-produced plasma discharge plasma |
| title | Extreme Ultraviolet Radiation Sources from Dense Plasmas |
| title_full | Extreme Ultraviolet Radiation Sources from Dense Plasmas |
| title_fullStr | Extreme Ultraviolet Radiation Sources from Dense Plasmas |
| title_full_unstemmed | Extreme Ultraviolet Radiation Sources from Dense Plasmas |
| title_short | Extreme Ultraviolet Radiation Sources from Dense Plasmas |
| title_sort | extreme ultraviolet radiation sources from dense plasmas |
| topic | XUV light source plasma radiation source laser-produced plasma discharge plasma |
| url | https://www.mdpi.com/2218-2004/11/9/118 |
| work_keys_str_mv | AT klausbergmann extremeultravioletradiationsourcesfromdenseplasmas |