Simple Technique to Improve Essentially the Performance of One-Stage Op-Amps in Deep Submicrometer CMOS Technologies
A comparative study of one-stage-amp performance improvement based on simulations in 22 nm, 45 nm, 90 nm, and 180 nm in deep submicrometer CMOS technologies is discussed. Generic SPICE models were used to simulate the circuits. It is shown that in all cases a simple modification using resistive loca...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-01-01
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| Series: | Journal of Low Power Electronics and Applications |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-9268/13/1/4 |