Microstructures and Mechanical Properties of TiCrZrNbNx Alloy Nitride Thin Films

The pure elements Ti, Zr, Cr, Nb were selected to produce an TiCrZrNb alloy target and deposited thin films thereof by a reactive high vacuum DC sputtering process. Nitrogen was used as the reactive gas to deposit the nitride thin films. The effect of nitriding on the properties of the TiCrZrNbNx fi...

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Bibliographic Details
Main Authors: Chun-Huei Tsau, Yu-Hsin Chang
Format: Article
Language:English
Published: MDPI AG 2013-11-01
Series:Entropy
Subjects:
Online Access:http://www.mdpi.com/1099-4300/15/11/5012