About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching Processes—The Method of Spectral Redundancy Reduction
In this study, we present the Method of Spectral Redundancy Reduction (MSRR) for analyzing OES (optical emission spectroscopy) data of dry etching processes based on the principles of spectral clustering. To achieve this, the OES data are transformed into abstract graph matrices whose associated eig...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2024-03-01
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| Series: | Plasma |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2571-6182/7/1/15 |