Synthesis of TiO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Double-Layer Inverse Opal by Thermal and Plasma-Assisted Atomic Layer Deposition for Photocatalytic Applications

Synthesis of TiO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Double-Layer Inverse Opal by Thermal and Plasma-Assisted Atomic Layer Deposition for Photocatalytic Applications

In comparison to conventional nano-infiltration approaches, the atomic layer deposition (ALD) technology exhibits greater potential in the fabrication of inverse opals (IOs) for photocatalysts. In this study, TiO<sub>2</sub> IO and ultra-thin films of Al<sub>2</sub>O<sub&g...

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Bibliographic Details
Main Authors: Hamsasew Hankebo Lemago, Feras Shugaa Addin, Dániel Atilla Kárajz, Tamás Igricz, Bence Parditka, Zoltán Erdélyi, Dóra Hessz, Imre Miklós Szilágyi
Format: Article
Language:English
Published: MDPI AG 2023-04-01
Series:Nanomaterials
Subjects:
inverse opal
TiO<sub>2</sub>
Al<sub>2</sub>O<sub>3</sub>
nanocomposites
thermal ALD
plasma ALD
Online Access:https://www.mdpi.com/2079-4991/13/8/1314

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https://www.mdpi.com/2079-4991/13/8/1314

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