Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO<sub>2</sub> or femtosecond laser. Subsequently, homogenization and residual stress removal a...

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Bibliographic Details
Main Authors: Zhenhua Fang, Jing Chen, Xiaolong Jiang, Chuanchao Zhang, Lijuan Zhang, Jingxuan Wang, Xiaoyu Luan, Haijun Wang, Qiankun Wu, Wei Liao
Format: Article
Language:English
Published: MDPI AG 2023-02-01
Series:Crystals
Subjects:
damage repair
modification
selective femtosecond laser-induced etching
Online Access:https://www.mdpi.com/2073-4352/13/2/309

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https://www.mdpi.com/2073-4352/13/2/309

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