Tailoring optical and resistance properties of the functional CuAlxOy semiconductor for applications as thermal infrared imagers

This is the first report on the optical and resistance properties of copper aluminum oxide thin films for applications as thermal infrared imagers. The deposition of these films was investigated under three series of reactive magnetron sputtering conditions. Structural characterization identified th...

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Bibliographic Details
Main Authors: Viet Hoang Vu, Bao Quang Tu, Quyen Xuan Phung, Vinh The Tran, Nghia Nhan Hoang, Dat Dinh Pham, Tuan Anh Mai, Hien Duy Tong, Minh Van Nguyen, Hung Quoc Nguyen, Hue Minh Nguyen, Huy Van Mai, Dung Chi Duong, Quang Minh Doan, Thuat Nguyen-Tran
Format: Article
Language:English
Published: Elsevier 2021-06-01
Series:Journal of Science: Advanced Materials and Devices
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2468217921000046