Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process

Fabrication of Microcrystalline Silicon Thin Film by Ionized Physical Vapor Deposition Process

The present manuscript describes the fabrication of microcrystalline silicon (µc-Si) thin films at room temperature using the ionized physical vapor deposition (iPVD) process. The iPVD chamber incorporates a planar DC magnetron and an additional RF coil to generate an intermediate dense plasma regio...

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Bibliographic Details
Main Authors: Rimlee Saikia, Bharat Kakati, Tonmoi Hazarika, Shivam Sharma, Tapan Rajbongshi, Mausumi Das, Subir Biswas, Sarathi Kundu, Manoj Kumar Mahanta
Format: Article
Language:English
Published: MDPI AG 2025-01-01
Series:Crystals
Subjects:
magnetron sputtering
ionized physical vapor deposition
silicon thin film
micro-crystallinity
surface morphology
Online Access:https://www.mdpi.com/2073-4352/15/2/106

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https://www.mdpi.com/2073-4352/15/2/106

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